Continuous film formation of different metal types is also possible! "Sputtering processing"
Metal thin films are formed from roll to roll on various substrates.
At Kawamura Industries, we perform sputtering processing of copper, nichrome alloy, and chrome onto various substrates. If greater adhesion is required, we can suggest using our plasma treatment as a pre-treatment. **Features of Kawamura Industries' Sputtering Processing** - Roll to roll sputtering processing → Example of copper sputtering: thickness 0.1 to 0.2 μm - Capable of continuous film formation with different metal types → Multiple cathodes used - Supports sputtering of copper, nichrome alloy, and chrome *Please consult us regarding target materials other than those listed above. *For more details, please refer to the PDF materials or feel free to contact us.
- Company：河村産業
- Price：Other
